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Your Position: Facilities -> Research FacilitiesFacilities |
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PECVD Carbon System |
Model: Carbon
Person in Charge:Rende Chen Tel:+86-574-86685036
Main Parameters: △Plasma source: ARC, PECVD,ALD △Base Pressure:<1.0×10-5Torr △Chamber size:Φ500×300mm △Substrate bias: 0~650V,5~350kHz
Applications: The system can be used to deposit various functional coatings and the surface modification of plasma treatment. The substrates include metal, alloy, polymer, ceramic, fiber and so on.
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PECVD System |
Model: P400
Person in Charge:Rende Chen Tel:+86-574-86685036
Main Parameters: △Plasma source:magnetron sputtering, PECVD △Base Pressure:<1.0×10-5Torr △Chamber size:Φ350×300mm △Substrate bias:DC ( ~200V),RF (13.56MHz, 3.6KW),
Applications: The system can be used to deposit various functional coatings and the surface modification of plasma treatment. The substrates include metal, alloy, polymer, ceramic, fiber and so on.
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ARC System |
Model: Manufacturer:NIMTE, China and J&L, Korea
Person in Charge:Dr. Zhengyu Wang Tel:+86-574-86685036
Main Parameters: △Plasma source: linear and end-hall ion beam, metal arc, HIPIMS sputtering △Base pressure:<1.0×10-5Torr △Chamber size:Φ700×650mm △Substrate turntable:6 axels with revolution and rotation (Speed :0~30rpm) △Substrate bias:pulse( 2~100KHZ, ~1200V),
Applications: This system is specially designed to deposit the functional nano-structured coatings with high performance like ta-C, CrN, TiN, TiAlN, metal alloy thin films etc. on the various substrates.
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